NANOTECHNOLOGY

Nanotechnological techniques include those used for fabrication of nanowires, those used in semiconductor fabrication such as deep ultraviolet lithography, electron beam lithography, focused ion beam machining, nanoimprint lithography, atomic layer deposition, and molecular vapor deposition, and further including molecular self-assembly techniques such as those employing di-block copolymers. However, all of these techniques preceded the nanotech era, and are extensions in the development of scientific advancements rather than techniques which were devised with the sole purpose of creating nanotechnology and which were results of nanotechnology research.

Nanoscience and nanotechnology only became possible in the 1910s with the development of the first tools to measure and make nanostructures. But the actual development started with the discovery of electrons and neutrons which showed scientists that matter can really exist on a much smaller scale than what we normally think of as small, and/or what they thought was possible at the time. It was at this time when curiosity for nanostructures had originated.

The atomic force microscope (AFM) and the Scanning Tunneling Microscope (STM) are two early versions of scanning probes that launched nanotechnology. There are other types of scanning probe microscopy, all flowing from the ideas of the scanning confocal microscope developed by Marvin Minsky in 1961 and the scanning acoustic microscope (SAM) developed by Calvin Quate and coworkers in the 1970s, that made it possible to see structures at the nanoscale. The tip of a scanning probe can also be used to manipulate nanostructures (a process called positional assembly). However, this is a very slow process. This led to the development of various techniques of nanolithography such as dip pen nanolithography, electron beam lithography or nanoimprint lithography. Lithography is a top-down fabrication technique where a bulk material is reduced in size to nanoscale pattern.

The top-down approach anticipates nanodevices that must be built piece by piece in stages, much as manufactured items are currently made.

Scanning probe microscopy is an important technique both for characterization and synthesis of nanomaterials. Atomic force microscopes and scanning tunneling microscopes can be used to look at surfaces and to move atoms around. By designing different tips for these microscopes, they can be used for carving out structures on surfaces and to help guide self-assembling structures. Atoms can be moved around on a surface with scanning probe microscopy techniques, but it is cumbersome, expensive and very time-consuming. For these reasons, it is not feasible to construct nanoscaled devices atom by atom. Assembling a billion transistor microchips at the rate of about one transistor an hour is inefficient.

In contrast, bottom-up techniques build or grow larger structures atom by atom or molecule by molecule. These techniques include chemical synthesis, self-assembly and positional assembly. Another variation of the bottom-up approach is molecular beam epitaxy or MBE. Researchers at Bell Telephone Laboratories like John R. Arthur. Alfred Y. Cho, and Art C. Gossard developed and implemented MBE as a research tool in the late 1960s and 1970s. Samples made by MBE were key to to the discovery of the fractional quantum Hall effect for which the 1998 Nobel Prize in Physics was awarded. MBE allows scientists to lay down atomically-precise layers of atoms and, in the process, build up complex structures. Important for research on semiconductors, MBE is also widely used to make samples and devices for the newly emerging field of spintronics.

Newer techniques such as Dual Polarisation Interferometry are enabling scientists to measure quantitatively the molecular interactions that take place at the nano-scale.